著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Ho Rang-Ching and Owe-Yang D. C. and Lin Shang-Ho and Chen Harrison and Shih J. C. and Hsu Chia-Sui and Chen J. H.,Reflow Process for Contact Hole ArF Lithography,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2004,17,4,497-500,https://cir.nii.ac.jp/crid/1390282679302108288,https://doi.org/10.2494/photopolymer.17.497