著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Morisawa Taku and Matsuzawa Nobuyuki and Mori Shigeyasu and Kaimoto Yuko and Endo Masayuki and Kuhara Koichi and Ohfuji Takeshi and Sasago Masaru,Chemically Amplified Si-contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and its Application to Bi-Layer Resist Process.,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,1997,10,4,589-594,https://cir.nii.ac.jp/crid/1390282679302149760,https://doi.org/10.2494/photopolymer.10.589