著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
SAITO SATOSHI and KIHARA NAOKO and NAITO TAKUYA and NAKASE MAKOTO and NAKASUGI TETSURO and KATO YOSHIMITSU,High Performance Chemically Amplified Positive Electron-Beam Resist: Optimization of Base Additives for Environmental Stabilization.,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,1996,9,4,677-684,https://cir.nii.ac.jp/crid/1390282679302186368,https://doi.org/10.2494/photopolymer.9.677