Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Yoshimura Toshiyuki and Yamamoto Jiro and Shiraishi Hiroshi and Uchino Shou-ichi and Terasawa Tsuneo and Mural Fumio and Okazaki Shinji,Effects of Molecular-Weight Distributions of Resist Polymers and Process Control on Lithography for 0.1.MU.m and Below.,Journal of Photopolymer Science and Technology,0914-9244,The Society of Photopolymer Science and Technology(SPST),1997,10,4,629-634,https://cir.nii.ac.jp/crid/1390282679302241920,https://doi.org/10.2494/photopolymer.10.629