Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Sakai Kazunori and Shiratani Motohiro and Fujisawa Tomohisa and Inukai Koji and Sakai Kaori and Maruyama Ken and Hoshiko Kenji and Ayothi Ramakrishnan and Santos Andreia and Naruoka Takehiko and Nagai Tomoki,Novel EUV Resists Materials for 16nm HP and beyond,Journal of Photopolymer Science and Technology,09149244,The Society of Photopolymer Science and Technology(SPST),2014,27,5,639-644,https://cir.nii.ac.jp/crid/1390282679302434304,https://doi.org/10.2494/photopolymer.27.639