著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Passarelli James and Sortland Miriam and Re Ryan Del and Cardineau Brian and Sarma Chandra and Freedman Daniel A. and Brainard Robert L.,Bismuth Resists for EUV Lithography,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2014,27,5,655-661,https://cir.nii.ac.jp/crid/1390282679302439424,https://doi.org/10.2494/photopolymer.27.655