Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
PAWLOWSKI GEORG and DAMMEL RALPH and PRZYBILLA KLAUS-JÜRGEN and RÖSCHERT HORSY and SPIESS WALTER,Novel photoacid generators: Key components for the progress of chemically amplified photoresist systems.,Journal of Photopolymer Science and Technology,0914-9244,The Society of Photopolymer Science and Technology(SPST),1991,4,3,389-402,https://cir.nii.ac.jp/crid/1390282679302941184,https://doi.org/10.2494/photopolymer.4.389