著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Horibe Hideo and Kamiura Tomosumi and Yoshida Kunio,Removal of Positive-tone Diazonaphthoquinone/Novolak Resist Using UV Laser lrradiation,Journal of Photopolymer Science and Technology,09149244,フォトポリマー学会,2005,18,2,181-185,https://cir.nii.ac.jp/crid/1390282679302949504,https://doi.org/10.2494/photopolymer.18.181