{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1390282679366706176.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.1246/nikkashi.1980.809"}},{"identifier":{"@type":"URI","@value":"https://www.jstage.jst.go.jp/article/nikkashi1972/1980/6/1980_6_809/_pdf"}},{"identifier":{"@type":"NAID","@value":"130004060009"}}],"dc:title":[{"@language":"en","@value":"Electrical Behaviours of Stable Conductive Tin Oxide Films"},{"@language":"ja","@value":"安定な導電性酸化スズ薄膜の電気特性"},{"@value":"導電性酸化すず薄膜の研究　ＩＩ　　安定な導電性酸化すず薄膜の電気特性"}],"description":[{"type":"abstract","notation":[{"@language":"en","@value":"To find out the best sample of tin oxide films for electronic apparatus, the following examinations were carried out: The temperature dependence of the electrical resistance of the films with and without load, the variation of their electrical resistance with temperature cycling, the moisture dependence of the electrical resistance, the electrical load test, reliability test and the secular changes of the electrical resistance after the lapse of seventeen years. Among the various samples, the tin oxide films containing 2% antimony and prepared in the temperature-controlled furnace at 730°C showed most successful characteristics. The film is proved to be stable enough for the use in electronic instruments."},{"@language":"ja","@value":"酸化スズ薄膜は光透過性のよい安定な金属酸化物薄膜である。しかし,この薄膜は薄膜作成温度範囲が広く,薄膜作成温度によって薄膜の特性が異なる。電気特性の再現性のよい薄膜を得るには,十分温度調節した電気炉の中で薄膜作成温度730℃とし薄膜成分としてスズに対しアンチモンを2%含有する薄膜が適していることを見いだした。本報告ではこの酸化スズ薄膜の電気抵抗率の経年変化および温度係数の経年変化を長期間にわたって測定し薄膜成分についてさらに詳細な解析を行なった。また作成温度730℃の薄膜は,これ以下の温度で作成した薄膜にくらべて電気抵抗率,温度係数の経年変化が小さく安定である。<BR>薄膜の特性として面積抵抗率20Ωないし1.9kΩの範囲で抵抗値の変化率は耐湿,負荷,負荷寿命,温度サイクルなどの試験で±10%以内である。酸化スズ薄膜はその作成プロセスを適当に選べばきわめて安定性の高い透明導電性薄膜として利用することができることを見いだした。"}],"abstractLicenseFlag":"disallow"}],"creator":[{"@id":"https://cir.nii.ac.jp/crid/1410851320454380800","@type":"Researcher","personIdentifier":[{"@type":"NRID","@value":"9000255706191"}],"foaf:name":[{"@language":"en","@value":"TOKUDA Yoshio"},{"@language":"ja","@value":"徳由 由雄"}],"jpcoar:affiliationName":[{"@language":"ja","@value":"東京コスモス電機株式会社"},{"@language":"en","@value":"Tokyo Cosmos Electric Inc."}]}],"publication":{"publicationIdentifier":[{"@type":"PISSN","@value":"03694577"},{"@type":"EISSN","@value":"21850925"}],"prism:publicationName":[{"@language":"en","@value":"NIPPON KAGAKU KAISHI"},{"@language":"ja","@value":"日本化学会誌（化学と工業化学）"},{"@language":"en","@value":"Nippon Kagaku Kaishi"},{"@language":"ja","@value":"日化"},{"@language":"en","@value":"NIPPON KAGAKU KAISHI"},{"@language":"ja","@value":"日本化学会誌"}],"dc:publisher":[{"@language":"en","@value":"The Chemical Society of Japan"},{"@language":"ja","@value":"公益社団法人 日本化学会"}],"prism:publicationDate":"1980-06-10","prism:volume":"1980","prism:number":"6","prism:startingPage":"809","prism:endingPage":"814"},"reviewed":"false","url":[{"@id":"https://www.jstage.jst.go.jp/article/nikkashi1972/1980/6/1980_6_809/_pdf"}],"availableAt":"1980-06-10","foaf:topic":[{"@id":"https://cir.nii.ac.jp/all?q=General%20Chemistry","dc:title":"General Chemistry"}],"dataSourceIdentifier":[{"@type":"JALC","@value":"oai:japanlinkcenter.org:0018973857"},{"@type":"CROSSREF","@value":"10.1246/nikkashi.1980.809"},{"@type":"CIA","@value":"130004060009"}]}