Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
MATSUI ISAO,CVD Material Processing. A Role of O Radical on the Formation of O2 Gas Plasma.,KAGAKU KOGAKU RONBUNSHU,0386216X,"The Society of Chemical Engineers, Japan",2000,26,6,811-815,https://cir.nii.ac.jp/crid/1390282679485864960,https://doi.org/10.1252/kakoronbunshu.26.811