Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Fujino Katsuhiro and Maeda Kazuo,Characteristics of Atmospheric Pressure CVD Films Deposited Using Organic Silicate/O<sub>3</sub> (Base Material Dependence),IEEJ Transactions on Fundamentals and Materials,03854205,The Institute of Electrical Engineers of Japan,1991,111,7,652-658,https://cir.nii.ac.jp/crid/1390282679576262912,https://doi.org/10.1541/ieejfms1990.111.7_652