Development of Nanometer-level Accurate Replication Process Using Electroforming

DOI 6 Citations 6 References

Bibliographic Information

Other Title
  • 電鋳法によるナノ精度形状転写プロセスの開発
  • Development of Nanometer-level Accurate Replication Process Using Electroforming -Optimization of Room Temperature Nickel Electrodeposition Conditions and Precise Figure Replication of Mandrel
  • —Optimization of Room Temperature Nickel Electrodeposition Conditions and Precise Figure Replication of Mandrel—
  • —常温ニッケル電析条件の検討とマンドレルの高精度転写—

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Description

Electroforming is a major replication method for producing precise and complicated shapes. In industry, precise optical components and molds are produced by the electroforming process for a long time. Recently, this method has also been used in MEMS fields for mass production of the nanometer pattern. In this study, we focus on the electrodeposition condition to increase the replication accuracy. In order to remove the influence of thermal deformation from the replication accuracy, Ni electrodeposition under a room temperature condition is employed. The electrodeposition condition is optimized from the viewpoint of the internal stress. Then we developed the electrodeposition system which can remove the babble on an electrodeposited film perfectly by vacuum degassing. The results of the replication experiment of a mandrel indicate that the proposed condition will open new applications and devises in electroforming.

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Details 詳細情報について

  • CRID
    1390282679807064960
  • NII Article ID
    130004745481
  • DOI
    10.2493/jjspe.80.582
  • ISSN
    1882675X
    09120289
  • Text Lang
    ja
  • Data Source
    • JaLC
    • Crossref
    • CiNii Articles
  • Abstract License Flag
    Disallowed

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