著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
CHO Sung Hyuk and CHOI Doo Jin,Characterization of SiC:H films deposited using HMDS precursor with C2H2 dilution gas by remote PECVD system,Journal of the Ceramic Society of Japan,18820743,公益社団法人 日本セラミックス協会,2009,117,1365,558-560,https://cir.nii.ac.jp/crid/1390282680260208384,https://doi.org/10.2109/jcersj2.117.558