Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
YOSHIMURA Satoru and IKUSE Kazumasa and SUGIMOTO Satoshi and MURAI Kensuke and KIUCHI Masato and HAMAGUCHI Satoshi,Hydrogen Plasma Exposure of Polymethylmethacrylate and Etching by Low Energy Ar<sup>+</sup> Ion Beam,Journal of the Vacuum Society of Japan,18822398,The Vacuum Society of Japan,2013,56,4,129-132,https://cir.nii.ac.jp/crid/1390282680272825728,https://doi.org/10.3131/jvsj2.56.129