Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Yamauchi Eiki and Taniguchi jyun and Miyamoto iwao and Ono susumu,Electron beam exposure Characteristic of negative electron beam resist (HSQ),Proceedings of JSPE Semestrial Meeting,,The Japan Society for Precision Engineering,2006,2006S,0,323-324,https://cir.nii.ac.jp/crid/1390282680630427136,https://doi.org/10.11522/pscjspe.2006s.0.323.0