Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Toiyama Kiyokazu and Yamashita Hiroyuki and Nawachi Norio,Optimization for thermal oxidation of silicon,Journal of Quality Engineering Society,2189-633X,Robust Quality Engineering Society,1999,7,1,43-49,https://cir.nii.ac.jp/crid/1390282680740400384,https://doi.org/10.18890/qes.7.1_43