Development of the local carburizing technology with microwave-enhanced high-density plasma generated near thee substrate

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  • マイクロ波支援高密度基材近傍プラズマによる局所浸炭技術の開発

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<p>Nowadays, automobile production is promoted automatically production, but carburizing process is not yet applied for automatically production because this process has many steps. We think that we can omit some steps to be pulsated MVP method, said by KOUSAKA, but this method is not yet applied for carburizing process. In this study, we clarified that MVP method can be applied carburizing process for SCM415 disk without substrate heating heater. We conducted substrate heating test and plasma carburizing test by MVP. The results show that substrate heating to 800 oC by MVP is possible and no-sooting specimen have bigger carburizing depth than sooting ones. Moreover, it is suggested that we can prevent the sooting by increasing voltage applied to the substrate.</p>

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