Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Naito Takuya and Asakawa Koji and Shida Naomi and Ushirogouchi Tohru and Nakase Makoto,Highly Transparent Chemically Amplified ArF Excimer Laser Resists by Absorption Band Shift for 193 nm Wavelength.,Japanese Journal of Applied Physics,0021-4922,The Japan Society of Applied Physics,1994,33,12B,7028-7032,https://cir.nii.ac.jp/crid/1390282681221953408,https://doi.org/10.1143/jjap.33.7028