Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Morishita Shunsuke and Uchida Yasutaka and Matsumura Masakiyo,Atomic-Layer Chemical-Vapor-Deposition of SiO2 by Cyclic Exposures of CH3OSi(NCO)3 and H2O2.,Japanese Journal of Applied Physics,0021-4922,The Japan Society of Applied Physics,1995,34,10,5738-5742,https://cir.nii.ac.jp/crid/1390282681223066368,https://doi.org/10.1143/jjap.34.5738