Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Kawasaki Hiroharu and Ohkura Hiroshi and Fukuzawa Tsuyoshi and Shiratani Masaharu and Watanabe Yukio and Yamamoto Yasuo and Suganuma Shinji and Hori Masaru and Goto Toshio,Roles of SiH3 and SiH2 Radicals in Particle Growth in rf Silane Plasmas.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,1997,36,7B,4985-4988,https://cir.nii.ac.jp/crid/1390282681225635328,https://doi.org/10.1143/jjap.36.4985