著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Sakai Kentaro and Yoshino Kenji and Fukuyama Atsuhiko and Yokoyama Hirosumi and Ikari Tetsuo and Maeda Kouji,Crystallization of Amorphous GeSe2 Semiconductor by Isothermal Annealing without Light Radiation,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2000,39,3A,1058-1061,https://cir.nii.ac.jp/crid/1390282681227748864,https://doi.org/10.1143/jjap.39.1058