著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Narihiro Mitsuru and Wakabayashi Hitoshi and Ueki Makoto and Arai Kohichi and Ogura Takashi and Ochiai Yukinori and Mogami Tohru,Intra-Level Mix-and-Match Lithography Process for Fabricating Sub-100-nm Complementary Metal-Oxide-Semiconductor Devices using the JBX-9300FS Point-Electron-Beam System.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2000,39,12B,6843-6848,https://cir.nii.ac.jp/crid/1390282681228917632,https://doi.org/10.1143/jjap.39.6843