Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Asami Katsuhiko and Koiwa Ichiro and Yamanobe Tomomi,Effects of lon Etching and Annealing in O2 Atmosphere Following lon Etching on Properties and Chemistry of Sr0.9Bi2.1Ta2O9+a Thin Films.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,1999,38,9B,5423-5427,https://cir.nii.ac.jp/crid/1390282681229399552,https://doi.org/10.1143/jjap.38.5423