Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Mayusumi Masanori and Imai Masato and Nakahara Shinji and Inoue Kazutoshi and Habuka Hitoshi,Morphology of Silicon Oxide Film on Silicon Wafer Surface during Its Removal Process in a Hydrogen Ambient.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2001,40,11,6556-6560,https://cir.nii.ac.jp/crid/1390282681229862656,https://doi.org/10.1143/jjap.40.6556