著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Kunimune Yorinobu and Nishio Naoharu and Kodama Noriyuki and Kikuchi Hiroaki and Toda Takeshi and Mineji Akira and Shishiguchi Seiichi and Saito Shuichi,Lateral Diffusion Distance Measurement of 40-80 nm Junctions by Etching/TEM-Electron Energy Loss Spectroscopy Method,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,1999,38,4B,2314-2318,https://cir.nii.ac.jp/crid/1390282681230228864,https://doi.org/10.1143/jjap.38.2314