Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Uedono Akira and Muramatsu Makoto and Ubukata Tomohiro and Tanino Hirotoshi and Tanigawa Shoichiro and Nakano Akihiko and Yamamoto Hidekazu and Suzuki Ryoichi and Ohdaira Toshiyuki and Mikado Tomohisa,Oxygen-Related Defects Introduced by As+-Implantation through Cap Layers in Si Probed by Monoenergetic Positron Beams.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2000,39,11,6126-6129,https://cir.nii.ac.jp/crid/1390282681230732928,https://doi.org/10.1143/jjap.39.6126