著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Suzuki Tatsuya and Haneji Nobuo and Tada Kunio and Shimogaki Yukihiro and Nakano Yoshiaki,Electron Cyclotron Resonance-Reactive Ion Beam Etching of InP by Cyclic Injection of CH<sub>4</sub>/H<sub>2</sub>/Ar and O<sub>2</sub>,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2002,41,1,15-19,https://cir.nii.ac.jp/crid/1390282681231971200,https://doi.org/10.1143/jjap.41.15