著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Arai Eisuke and Iida Daisuke and Asai Hiroshi and Ieki Yasushi and Uchida Hideo and Ichimura Masaya,Applicability of Phosphorus and Boron Diffusion Parameters Extracted from Predeposition to Drive-in Diffusion for Bulk Silicon and Silicon-on-Insulator.,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2003,42,4A,1503-1510,https://cir.nii.ac.jp/crid/1390282681233642880,https://doi.org/10.1143/jjap.42.1503