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Nanoholes in InP and C60 Layers on GaAs Substrates by Using AlGaAs Nanowire Templates
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- Watanabe Yoshio
- NTT Advanced Technology Corporation
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- Gotoh Hideki
- NTT Basic Research Laboratories, NTT Corporation
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- Tateno Kouta
- NTT Basic Research Laboratories, NTT Corporation
Bibliographic Information
- Other Title
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- Nanoholes in InP and C<sub>60</sub> Layers on GaAs Substrates by Using AlGaAs Nanowire Templates
- Published
- 2005
- DOI
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- 10.1143/jjap.44.l428
- Publisher
- The Japan Society of Applied Physics
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Description
As one of the nano-scale fabrication techniques, free-standing nanowires are promising. We have developed a new method for nanohole fabrication using nanowire templates; that is, etching the exposed wires selectively after the layer growth. We have demonstrated nanoholed array in InP and C60 layers on GaAs substrates. For the metalorganic vapor phase epitaxy of InP, (111)B facets tend to form so that the AlGaAs nanowires are easily removed. Tilted nanowires and nanoholes are possible by using (311)B substrates. As another holed layer case, a C60 layer was tried. We found that this method can also be applied to the fragile material like C60.
Journal
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 44 (12-15), L428-L431, 2005
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390282681241991552
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- NII Article ID
- 210000059536
- 10015474150
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- NII Book ID
- AA11906093
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- ISSN
- 13474065
- 00214922
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- NDL BIB ID
- 7299151
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- Text Lang
- en
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- Data Source
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- JaLC
- NDL Search
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed
