Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Nishiguchi Katsuhiko and Crauste Olivier and Namatsu Hideo and Horiguchi Seiji and Ono Yukinori and Fujiwara Akira and Takahashi Yasuo and Inokawa Hiroshi,Back-Gate Effect on Coulomb Blockade in Silicon-on-Insulator Trench Wires,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,2005,44,10,7717-7719,https://cir.nii.ac.jp/crid/1390282681243377152,https://doi.org/10.1143/jjap.44.7717