著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
Yih C. M. and Wang C. L. and Chung Steve S. and Wu C. C. and Tan W. and Wu H. J. and Pi S. and Huang Daniel,New Insight into the Degradation Mechanism of Nitride Spacer with Different Post-Oxide in Submicron LDD n-MOSFET′s,Japanese Journal of Applied Physics,00214922,The Japan Society of Applied Physics,1998,37,3B,1035-1040,https://cir.nii.ac.jp/crid/1390282681246343552,https://doi.org/10.1143/jjap.37.1035