Electron beam sensitivities and thermal properties of heat-treated poly(methyl methacrylate-co-t-butyl methacrylate)s.
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- SAEKI Hideo
- LSI Research and Development Laboratory, Mitsubishi Electric Corporation
Bibliographic Information
- Other Title
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- 熱処理したポリ(メタクリル酸メチル‐CO‐メタクリル酸t‐ブチル)の感電子線性と熱的性質
- ネツ ショリシタ ポリ メタクリルサン メチル co メタクリルサン t ブチ
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Description
The relation of monomer ratios in poly (methyl methacrylate-co-t-butyl methacrylate) s to electron beam sensitivities and thermal properties of the heat-treated copolymers was investigated in order to develop a highly sensitive positive electron beam resist. These copolymers sustained weight loss as a result of heat-treatment at 250°C and the evolved gases during this heat-treatment were mainly composed of isobuten. Therefore this weight loss was due to elimination of the t-butyl groupsfrom the t-butyl methacrylate component in the copolymers. Cyclized acid anhydrides mainly formed on such portions of the heat-treated copolymer films. The glass transition temperature of the copolymers increases as a result of the heat-treatment, so that thermal stabilities were improved, with a higher content of t-butyl methacrylate in the copolymers. In these copolymers, a 37 mol%. composition of t-butyl methacrylate, designated CP-3-2, showed the highest sensitivity (0.35 μC/cmcm2) and a high γ-value (1.9). Moreover, the CP-3-2 resolved a micro circuit pattern (less than 1.0μm line width), and the resistance to dry etching of the CP-3-2 are higher than the values for poly (methyl methacrylate). It is clear that CP-3-2 has a higher performance for highly sensitive positive electron beam resist.
Journal
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- KOBUNSHI RONBUNSHU
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KOBUNSHI RONBUNSHU 43 (3), 153-160, 1986
The Society of Polymer Science, Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390282681500758656
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- NII Article ID
- 130003837005
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- NII Book ID
- AN00085011
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- ISSN
- 18815685
- 03862186
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- NDL BIB ID
- 3069544
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed