著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
KATAYAMA Yasushi and YOKOMIZO Masakazu and MIURA Takashi and KISHI Tomiya,Preparation of Novel Fluorosilicate Salt for Electrodeposition of Silicon at Low Temperature,Electrochemistry,13443542,公益社団法人 電気化学会,2001-11-05,69,11,834-836,https://cir.nii.ac.jp/crid/1390282752330361344,https://doi.org/10.5796/electrochemistry.69.834