著者名,論文名,雑誌名,ISSN,出版者名,出版日付,巻,号,ページ,URL,URL(DOI)
OHMI Shun-ichiro and TSUKAMOTO Yuya and MAILIG Rengie Mark D.,Etching Control of HfN Encapsulating Layer for PtHf-Silicide Formation with Dopant Segregation Process,IEICE Transactions on Electronics,0916-8524,一般社団法人 電子情報通信学会,2019-06-01,E102.C,6,453-457,https://cir.nii.ac.jp/crid/1390282763119633664,https://doi.org/10.1587/transele.2018fup0003