Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Chino Teruya and Watanabe Yuta and Tsukiyama Yosuke and Sohgawa Masayuki and Abe Takashi,Development of Dry-nano-polishing Technique using Reactive Ion Etching for Ultra Thin Titanium Wafer,IEEJ Transactions on Sensors and Micromachines,13418939,The Institute of Electrical Engineers of Japan,2021-04-01,141,4,103-107,https://cir.nii.ac.jp/crid/1390287540627223808,https://doi.org/10.1541/ieejsmas.141.103