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Characteristic of Molecular Ion Implanted Epitaxial Wafers (3) - Annealing Behavior of Hydrogen Trapped Implantation related defects using RTA -
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- KADONO TAKESHI
- SUMCO
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- Okuyama Ryosuke
- SUMCO
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- Hirose Ryo
- SUMCO
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- Masada Ayumi
- SUMCO
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- Kobayashi Koji
- SUMCO
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- Shigematsu Satoshi
- SUMCO
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- Koga Yoshihiro
- SUMCO
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- Okuda Hidehiko
- SUMCO
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- Kurita Kazunari
- SUMCO
Bibliographic Information
- Other Title
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- 分子イオン注入エピウェーハの製品特性(３) －RTA処理による注入欠陥に捕獲された水素の熱処理挙動解析－
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2018.1 (0), 3741-3741, 2018-03-05
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390293655509428992
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC