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Characteristics of Molecular Ion Implanted Epitaxial Wafers (1) - A study of CH<sub>2</sub>P ion implanted silicon epitaxial wafers-
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- Hirose Ryo
- SUMCO CORPORATION
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- Okuyama Ryosuke
- SUMCO CORPORATION
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- Kadono Takeshi
- SUMCO CORPORATION
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- Masada Ayumi
- SUMCO CORPORATION
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- Shigematsu Satoshi
- SUMCO CORPORATION
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- Kobayashi Kouji
- SUMCO CORPORATION
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- Koga Yoshihiro
- SUMCO CORPORATION
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- Okuda Hidehiko
- SUMCO CORPORATION
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- Kurita Kazunari
- SUMCO CORPORATION
Bibliographic Information
- Other Title
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- 分子イオン注入エピウェーハの製品特性（１）-CH<sub>2</sub>P注入エピタキシャルウェーハ特性解析-
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2018.1 (0), 3739-3739, 2018-03-05
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390293655509460480
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC