Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Yoshida Naomi and Brand Adam,High-k Metal Gate Process Technology and Challenges for 10 nm and Beyond,JSAP Annual Meetings Extended Abstracts,2436-7613,The Japan Society of Applied Physics,2015-02-26,2015.1,0,203-203,https://cir.nii.ac.jp/crid/1390296066523960576,https://doi.org/10.11470/jsapmeeting.2015.1.0_203