{"@context":{"@vocab":"https://cir.nii.ac.jp/schema/1.0/","rdfs":"http://www.w3.org/2000/01/rdf-schema#","dc":"http://purl.org/dc/elements/1.1/","dcterms":"http://purl.org/dc/terms/","foaf":"http://xmlns.com/foaf/0.1/","prism":"http://prismstandard.org/namespaces/basic/2.0/","cinii":"http://ci.nii.ac.jp/ns/1.0/","datacite":"https://schema.datacite.org/meta/kernel-4/","ndl":"http://ndl.go.jp/dcndl/terms/","jpcoar":"https://github.com/JPCOAR/schema/blob/master/2.0/"},"@id":"https://cir.nii.ac.jp/crid/1390303932789043456.json","@type":"Article","productIdentifier":[{"identifier":{"@type":"DOI","@value":"10.11470/jsapmeeting.2022.1.0_2808"}}],"dc:title":[{"@language":"ja","@value":"3次元積層型CMOSイメージセンサ向けSiウェーハの製品設計（Ⅳ） –Si系分子イオン注入において炭素がゲッタリング能力に与える影響–"},{"@language":"en","@value":"Product Design of Silicon Wafers for 3D Stacked CMOS Image Sensor (Ⅳ) – Effect of carbon on gettering capability in Si-based molecular ion implantation –"}],"dc:language":"ja","creator":[{"@id":"https://cir.nii.ac.jp/crid/1410303932789043462","@type":"Researcher","foaf:name":[{"@language":"ja","@value":"廣瀬 諒"},{"@language":"en","@value":"Hirose Ryo"}],"jpcoar:affiliationName":[{"@language":"en","@value":"SUMCO CORPORATION"},{"@language":"ja","@value":"株式会社 SUMCO"}]},{"@id":"https://cir.nii.ac.jp/crid/1410303932789043460","@type":"Researcher","foaf:name":[{"@language":"ja","@value":"門野 武"},{"@language":"en","@value":"Kadono Takeshi"}],"jpcoar:affiliationName":[{"@language":"en","@value":"SUMCO CORPORATION"},{"@language":"ja","@value":"株式会社 SUMCO"}]},{"@id":"https://cir.nii.ac.jp/crid/1410303932789043457","@type":"Researcher","foaf:name":[{"@language":"ja","@value":"柾田 亜由美"},{"@language":"en","@value":"Onaka-Masada Ayumi"}],"jpcoar:affiliationName":[{"@language":"en","@value":"SUMCO CORPORATION"},{"@language":"ja","@value":"株式会社 SUMCO"}]},{"@id":"https://cir.nii.ac.jp/crid/1410303932789043458","@type":"Researcher","foaf:name":[{"@language":"ja","@value":"奥山 亮輔"},{"@language":"en","@value":"Okuyama Ryosuke"}],"jpcoar:affiliationName":[{"@language":"en","@value":"SUMCO CORPORATION"},{"@language":"ja","@value":"株式会社 SUMCO"}]},{"@id":"https://cir.nii.ac.jp/crid/1410303932789043463","@type":"Researcher","foaf:name":[{"@language":"ja","@value":"小林 弘治"},{"@language":"en","@value":"Kobayashi Koji"}],"jpcoar:affiliationName":[{"@language":"en","@value":"SUMCO CORPORATION"},{"@language":"ja","@value":"株式会社 SUMCO"}]},{"@id":"https://cir.nii.ac.jp/crid/1410303932789043461","@type":"Researcher","foaf:name":[{"@language":"ja","@value":"鈴木 陽洋"},{"@language":"en","@value":"Suzuki Akihiro"}],"jpcoar:affiliationName":[{"@language":"en","@value":"SUMCO CORPORATION"},{"@language":"ja","@value":"株式会社 SUMCO"}]},{"@id":"https://cir.nii.ac.jp/crid/1410303932789043456","@type":"Researcher","foaf:name":[{"@language":"ja","@value":"古賀 祥泰"},{"@language":"en","@value":"Koga Yoshihiro"}],"jpcoar:affiliationName":[{"@language":"en","@value":"SUMCO CORPORATION"},{"@language":"ja","@value":"株式会社 SUMCO"}]},{"@id":"https://cir.nii.ac.jp/crid/1410303932789043459","@type":"Researcher","foaf:name":[{"@language":"ja","@value":"栗田 一成"},{"@language":"en","@value":"Kurita Kazunari"}],"jpcoar:affiliationName":[{"@language":"en","@value":"SUMCO CORPORATION"},{"@language":"ja","@value":"株式会社 SUMCO"}]}],"publication":{"publicationIdentifier":[{"@type":"EISSN","@value":"24367613"}],"prism:publicationName":[{"@language":"ja","@value":"応用物理学会学術講演会講演予稿集"},{"@language":"en","@value":"JSAP Annual Meetings Extended Abstracts"}],"dc:publisher":[{"@language":"en","@value":"The Japan Society of Applied Physics"},{"@language":"ja","@value":"公益社団法人 応用物理学会"}],"prism:publicationDate":"2022-02-25","prism:volume":"2022.1","prism:number":"0","prism:startingPage":"2808","prism:endingPage":"2808"},"jpcoar:conferenceName":"応用物理学会春季学術講演会","jpcoar:conferencePlace":"ハイブリッド開催（青山学院大学＋オンライン）","availableAt":"2022-02-25","foaf:topic":[{"@id":"https://cir.nii.ac.jp/all?q=26p-E104-8","dc:title":"26p-E104-8"},{"@id":"https://cir.nii.ac.jp/all?q=Silicon%20wafer","dc:title":"Silicon wafer"},{"@id":"https://cir.nii.ac.jp/all?q=Gettering","dc:title":"Gettering"},{"@id":"https://cir.nii.ac.jp/all?q=ion%20implantation","dc:title":"ion implantation"},{"@id":"https://cir.nii.ac.jp/all?q=26p-E104-8","dc:title":"26p-E104-8"},{"@id":"https://cir.nii.ac.jp/all?q=%E7%B5%90%E6%99%B6%E5%B7%A5%E5%AD%A6","dc:title":"結晶工学"},{"@id":"https://cir.nii.ac.jp/all?q=%E7%B5%90%E6%99%B6%E8%A9%95%E4%BE%A1%EF%BC%8C%E4%B8%8D%E7%B4%94%E7%89%A9%E3%83%BB%E7%B5%90%E6%99%B6%E6%AC%A0%E9%99%A5","dc:title":"結晶評価，不純物・結晶欠陥"},{"@id":"https://cir.nii.ac.jp/all?q=%E3%82%B2%E3%83%83%E3%82%BF%E3%83%AA%E3%83%B3%E3%82%B0%E3%80%81%E3%83%91%E3%83%83%E3%82%B7%E3%83%99%E3%83%BC%E3%82%B7%E3%83%A7%E3%83%B3","dc:title":"ゲッタリング、パッシベーション"},{"@id":"https://cir.nii.ac.jp/all?q=%E3%82%B7%E3%83%AA%E3%82%B3%E3%83%B3%E3%82%A6%E3%82%A7%E3%83%BC%E3%83%8F","dc:title":"シリコンウェーハ"},{"@id":"https://cir.nii.ac.jp/all?q=%E3%82%B2%E3%83%83%E3%82%BF%E3%83%AA%E3%83%B3%E3%82%B0","dc:title":"ゲッタリング"},{"@id":"https://cir.nii.ac.jp/all?q=%E3%82%A4%E3%82%AA%E3%83%B3%E6%B3%A8%E5%85%A5","dc:title":"イオン注入"}],"dataSourceIdentifier":[{"@type":"JALC","@value":"oai:japanlinkcenter.org:2014013839"}]}