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Preparation of HfO<sub>2</sub>–Al<sub>2</sub>O<sub>3</sub> nanocomposite films using chemical vapor deposition

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  • MATSUMOTO Shogen
    Graduate School of Environment and Information Sciences, Yokohama National University
  • ITO Akihiko
    Graduate School of Environment and Information Sciences, Yokohama National University

Abstract

<p>We prepared HfO2–Al2O3 nanocomposite films using chemical vapor deposition. Fibrous and lamellar microstructures formed in the monoclinic and tetragonal HfO2 (m/t-HfO2)–α-Al2O3 films at deposition temperature of 1573 K and Al mole fraction in the precursor vapor of 36–74 mol %Al2O3. Characterization by electron microscopy revealed that the m/t-HfO2 fibrous and lamellar structures are present throughout the α-Al2O3 columnar matrix above 50 mol %Al2O3 (55 vol %Al2O3), while α-Al2O3 lamellar structure was formed in m-HfO2 matrix below 50 mol %Al2O3.</p>

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