Preparation of HfO2–Al2O3 nanocomposite films using chemical vapor deposition
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- MATSUMOTO Shogen
- Graduate School of Environment and Information Sciences, Yokohama National University
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- ITO Akihiko
- Graduate School of Environment and Information Sciences, Yokohama National University
書誌事項
- タイトル別名
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- Preparation of HfO<sub>2</sub>–Al<sub>2</sub>O<sub>3</sub> nanocomposite films using chemical vapor deposition
抄録
<p>We prepared HfO2–Al2O3 nanocomposite films using chemical vapor deposition. Fibrous and lamellar microstructures formed in the monoclinic and tetragonal HfO2 (m/t-HfO2)–α-Al2O3 films at deposition temperature of 1573 K and Al mole fraction in the precursor vapor of 36–74 mol %Al2O3. Characterization by electron microscopy revealed that the m/t-HfO2 fibrous and lamellar structures are present throughout the α-Al2O3 columnar matrix above 50 mol %Al2O3 (55 vol %Al2O3), while α-Al2O3 lamellar structure was formed in m-HfO2 matrix below 50 mol %Al2O3.</p>
収録刊行物
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- Journal of the Ceramic Society of Japan
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Journal of the Ceramic Society of Japan 129 (1), 1-6, 2021-01-01
公益社団法人 日本セラミックス協会
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詳細情報
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- CRID
- 1390568456341915648
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- NII論文ID
- 130007965510
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- ISSN
- 13486535
- 18820743
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可