ナノインプリントリソグラフィーを用いたナノ構造体造形

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タイトル別名
  • Fabrication of Nanostructures by Nanoimprint Lithography
  • ナノインプリントリソグラフィー オ モチイタ ナノ コウゾウタイ ゾウケイ

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<p>Nanoimprint lithography (NIL) is one of promising micro- and nano-fabrication methods from single-digit nanometers. In this paper, we introduce the following topics: process and history, challenges for single-digit-nanometer patterning, practical issues, and a “print-and-imprint” method. The concept like NIL was first reported by Japanese researchers in 1977, and its feasibility for the fabrication of nanostructures has been demonstrated since 1995. NIL consists of nanoimprinting and lithography processes: the former is the transformation of micro- and nano-structures on a mold surface onto resistant materials and the latter is the pattern transfer from the molded mask to a substrate surface. Owing to its easy-to-use and high-throughput features, NIL has been studied in a broad range of fields such as semiconductors, optics, plasmonics, biology, and fluidic devices. Its potential of single-digit-nanometer scale resolution was confirmed in both thermal and ultraviolet (UV) NIL in 2000s. Practical micro- and nano-fabrication by NIL often faces issues at multi-level sizes; for example, flatness of a mold and substrate, burrs in periphery, residual layer thickness, and pattern defects derived from trapped air bubbles, pull-out of resistant materials during demolding, and impurity particles in ambient condition. We propose a new technology of “print-and-imprint” method involving laser-drilled screen printing and UV-NIL, which could provide several solutions for the practical issues.</p>

収録刊行物

  • トライボロジスト

    トライボロジスト 66 (10), 744-749, 2021-10-15

    一般社団法人 日本トライボロジー学会

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