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Reaction Kinetic Analysis of Desorption Behavior of Hydrogen in Projection Range of Multi-Element Molecular Ion Implanted Epitaxial Wafer for Advanced CMOS image sensors
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- Masada Ayumi
- SUMCO
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- Okuyama Ryosuke
- SUMCO
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- Shigematsu Satoshi
- SUMCO
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- Hirose Ryo
- SUMCO
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- Koga Yoshihiro
- SUMCO
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- Kurita Kazunari
- SUMCO
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- Kadono Takeshi
- SUMCO
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- Okuda Hidehiko
- SUMCO
Bibliographic Information
- Other Title
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- 次世代CMOSイメージセンサ向け多元素分子イオン注入ウェーハにおける水素脱離挙動の反応速度論による解析と考察
- Published
- 2021-02-26
- DOI
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- 10.11470/jsapmeeting.2021.1.0_2356
- Publisher
- The Japan Society of Applied Physics
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2021.1 (0), 2356-2356, 2021-02-26
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390573947534242688
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC
