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Characteristics of Molecular Ion Implanted Epitaxial Wafers for CMOS Image Sensor (II) – Basic Characteristics of CH<sub>4</sub>N Ion Implanted Epitaxial Silicon Wafer –
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- Suzuki Akihiro
- SUMCO CORPORATION
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- Kadono Takeshi
- SUMCO CORPORATION
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- Hirose Ryo
- SUMCO CORPORATION
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- Okuyama Ryosuke
- SUMCO CORPORATION
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- Masada Ayumi
- SUMCO CORPORATION
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- Shigematsu Satoshi
- SUMCO CORPORATION
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- Kobayashi Koji
- SUMCO CORPORATION
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- Koga Yoshihiro
- SUMCO CORPORATION
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- Kurita Kazunari
- SUMCO CORPORATION
Bibliographic Information
- Other Title
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- CMOSイメージセンサ向け分子イオン注入エピタキシャルウェーハの製品特性（II） –CH<sub>4</sub>Nイオン注入エピタキシャルウェーハの基礎特性–
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2019.1 (0), 3323-3323, 2019-02-25
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390574677162970112
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC