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Characteristic of Molecular Cluster Ion Implanted Epitaxial Silicon Wafer (2) - Gettering Heavy Metal of Room Temperature Bonding Wafer -
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- Koga Yoshihiro
- SUMCO CORPORATION
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- Kadono Takeshi
- SUMCO CORPORATION
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- Okuyama Ryosuke
- SUMCO CORPORATION
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- Shigematsu Satoshi
- SUMCO CORPORATION
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- Hirose Ryo
- SUMCO CORPORATION
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- Masada Ayumi
- SUMCO CORPORATION
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- Okuda Hidehiko
- SUMCO CORPORATION
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- Kurita Kazunari
- SUMCO CORPORATION
Bibliographic Information
- Other Title
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- 分子クラスターイオン注入エピウェーハの製品特性(２) ー 常温接合エピウェーハの重金属ゲッタリング特性 ―
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2017.2 (0), 3524-3524, 2017-08-25
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390575418087186304
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC