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Characteristic of Molecular Ion Implanted Epitaxial Wafer (4) -Analysis of Gettering Mechanism for Heavy Metal by Using Atom Probe Tomography-
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- Shigematsu Satoshi
- SUMCO
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- Okuyama Ryosuke
- SUMCO
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- Hirose Ryo
- SUMCO
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- Kadono Takeshi
- SUMCO
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- Kurita Kazunari
- SUMCO
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- Koga Yoshihiro
- SUMCO
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- Okuda Hidehiko
- SUMCO
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- Masada Ayumi
- SUMCO
Bibliographic Information
- Other Title
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- 分子クラスターイオン注入エピウェーハの製品特性（４） -３次元アトムプローブによる重金属ゲッタリングメカニズムの解析-
- Published
- 2017-08-25
- DOI
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- 10.11470/jsapmeeting.2017.2.0_3526
- Publisher
- The Japan Society of Applied Physics
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2017.2 (0), 3526-3526, 2017-08-25
The Japan Society of Applied Physics
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Keywords
Details 詳細情報について
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- CRID
- 1390575418087355008
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC
