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Characteristic of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (2) - Hydrogen Passivation Effect of Room Temperature Bonding Wafer -
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- Kurita Kazunari
- SUMCO CORPORATION
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- Koga Yoshihiro
- SUMCO CORPORATION
Bibliographic Information
- Other Title
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- 炭素クラスターイオン注入Siエピウェーハの特徴(2) ー 常温接合プロセスにおける水素のパッシベーション効果 ―
- Published
- 2017-03-01
- DOI
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- 10.11470/jsapmeeting.2017.1.0_3610
- Publisher
- The Japan Society of Applied Physics
Journal
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- JSAP Annual Meetings Extended Abstracts
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JSAP Annual Meetings Extended Abstracts 2017.1 (0), 3610-3610, 2017-03-01
The Japan Society of Applied Physics
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Details 詳細情報について
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- CRID
- 1390575661591959808
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- ISSN
- 24367613
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- Text Lang
- ja
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- Data Source
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- JaLC
