Author,Title,Journal,ISSN,Publisher,Date,Volume,Number,Page,URL,URL(DOI)
Hashimoto Yohei and Ozaki Ryo and Sano Tomoya and Furumoto Tatsuaki and Koyano Tomohiro and Hosokawa Akira,Development of Analysis Method of Polishing Pressure Distribution in Double-sided Lapping of Thin Wafer,Proceedings of JSPE Semestrial Meeting,,The Japan Society for Precision Engineering,2019-03-01,2019S,0,129-129,https://cir.nii.ac.jp/crid/1390845702276484864,https://doi.org/10.11522/pscjspe.2019s.0_129