書誌事項
- タイトル別名
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- <i>In-situ</i> Optical Microscopy of Crystal Growth of Graphene Using Thermal Radiation
- グラフェン ノ ケッショウ セイチョウ ノ ネツ ホウシャコウ ニ ヨル ソノ ジョウケンビカンサツ
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抄録
<p>Graphene, an atomically thin sheet composed of sp2 carbon atoms, has been the most attractive material in this decade. The fascinating properties of graphene are exhibited when it is monolayer. Chemical vapor deposition (CVD) is widely used to produce monolayer graphene selectively in large-area. Here we introduce “radiation-mode optical microscopy” which we have developed in order to realize the in-situ observation of the CVD growth of graphene. We show the method to observe graphene as bright contrast on Cu substrates in thermal radiation images. The growth mechanism, the nucleation site and rate limiting process, revealed by the in-situ observation is presented. Finally, we show the CVD growth of graphene on Au substrates, resulting in the tuning of the emissivity of graphene by the pre-treatment procedures. Our method is not only a way to observe the graphene growth but also shed light on the thermal radiation property of graphene.</p>
収録刊行物
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- 表面と真空
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表面と真空 62 (10), 629-634, 2019-10-10
公益社団法人 日本表面真空学会
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詳細情報
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- CRID
- 1390845702297087104
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- NII論文ID
- 130007726598
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- NII書誌ID
- AA12808657
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- ISSN
- 24335843
- 24335835
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- NDL書誌ID
- 030049896
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
- KAKEN
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- 抄録ライセンスフラグ
- 使用不可