Based on the first lecture on ‘Electron sources and guns 1,’ which discussed the optical/physical properties of electron sources, this second article deals with two fundamental designing technologies of electron guns. The one is the vacuum technology. The operation principles of cold field emitters (CFEs) are described from the viewpoint of vacuum science. The advantages of extremely high vacuum (EHV) over conventional ultra high vacuum (UHV) are explained in terms of the probe current stability and the high current capability. The second is the optical designing technique to achieve a high probe current. The point cathode optics require the consideration of ‘electron gun aberrations’ since its virtual source is very small and the angular current intensity low. The introduction of an optical parameter ‘electron gun focal length’ enables quantitative evaluation of gun aberration influences and the optimization of lens operation conditions.
"},{"@language":"ja","@value":"前篇の「電子源電子銃の物理的・電子光学的基礎」の内容を受け，本後篇では，電子銃で重要となる二つの設計技術について取り上げる．一つ目は真空技術である．まず，冷陰極電界放出電子銃を例に，その動作原理と真空との関係を説明する．次に，電子銃の真空を従来の10–8 Pa（超高真空）から10–10 Pa（極高真空）にすることで可能になった電流安定性の向上や，大電流放出などの効果を紹介する．二つ目は大プローブ電流を取り出すための光学設計技術．ポイント陰極電子銃のクロスオーバ径は小さく角電流密度が低いためその光学設計では“電子銃部収差”の考慮が必要である．“電子銃焦点距離”という光学パラメータを導入することで収差影響の定量的な評価が可能となり電子銃やレンズ動作条件の最適化が図れることを示す．
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